Researchers into the emerging technology of EUV lithography need a source of EUV photons for a variety of applications. Existing sources of light are often too low in power, unreliable in operation, large, costly and complex.
The EQ-10 is a compact, easy-to-use, reliable, and cost-effective EUV light source, based on Energetiq's proven Electrodeless Z-pinch™ technology using Xenon gas. The EQ-10 EUV source is uniquely suited
for metrology and research applications. The EQ-10 has become the workhorse EUV source for the EUV community, through its proven reliability, ease of use, and low operating cost.
The Energetiq EQ-10 EUV Source's modular design makes it ready to be integrated into a process tool. The system includes the electrodeless Z-pinch source assembly, vacuum and gas subsystems, power delivery subsystem, and control electronics. The EQ-10 is capable of delivering up to 10 Watts of in-band EUV into 2pi steradians, and will run continuously at pulse repetition rates of up to 2 kHz.
- Sufficient power for a wide variety of applications
Up to 2 kHz repetition rate
- Continuous mode, 24/7
Small plasma size
- Below 1mm diameter
Unique patent-pending electrodeless Z-Pinch technology
- Low debris / low consumable cost
10W into 2pi using Xenon
Cost-effective and compact
- Low cost per EUV Watt
- Small footprint
CE-Mark and SEMI S2-0703 compliant