Measure deposition rates, film thickness, optical constants (n and k), and uniformity of semiconductors and dielectric layers in real-time with the F30 spectral reflectance system.
Dramatically improves productivity
Low cost - Can pay for itself in months
Accurate - Measure to better than ±1%
Fast-Measurements in seconds
Non-Invasive - Totally outside of deposition chamber
Easy to use - Intuitive Windows® software
Turn-key system sets up in minutes