- Advanced DUV optics and rugged design for highest uptime and the best system performance
- Array based detector system to ensure fast measurement
- Affordable, portable and small footprint table top design
- Measure film thickness and Refractive Index up to 5 layers over micron size region
- Allow to acquire reflection, transmission and absorption spectra in milliseconds
- Capable to be used for real time spectra, thickness, refractive index monitoring
- System comes with comprehensive optical constants database and library
- Advanced Software allows user to use either NK table, dispersion or composite model (EMA) for each individual film
- Integrated Vision, spectrum, simulation, film thickness measurement system
- Apply to many different type of substrates with different thickness up to 200mm size
- Deep ultraviolet light allows to measure film thickness down to 20Å
- 2D and 3D output graphics and user friendly data management interface
- Advanced Imaging software for dimension measurement such as angle, distance, area, particle counting and more
- Various options available to meet special applications
SYSTEM CONFIGURATION:
- Model: MSP100RTM
- Detector: CCD Array with 2048 pixels
- Light Source: High power DUV-Visible
- Automatic Stage: Black Anodized Aluminum Alloy with 5”x3” net travel distance and 1µm resolution, program controlled
- Motorized Z focus drive and X-Y-Z joystick
- Long Working Distance Objectives: 10x, 15x(DUV), 40x or 50x
- Communication: USB
- Measurement Type: Reflection/Transmission spectra, Film thickness/refractive index and feature dimensions
- Computer: Intel Core 2 Duo Processor with 200GB Hard drive and DVD+RW Burner plus 19” LCD Monitor
- Power: 110– 240 VAC /50-60Hz, 3 A
- Dimension: 16’x16’x18’ (Table top setup)
- Weight: 120 lbs total
- Warranty: One year labor and parts
Thông số kỹ thuật
- Wavelength range: 250 to 1000 nm
- Wavelength Resolution: 1nm
- Spot Size: 40µm (10x), 30µm (15x), 8µm (50x)
- Substrate Size: up to 20mm thick
- Measurable thickness range*: 20Å to 25 µm
- Measurement Time: 2 ms minimum
- Accuracy*: better than 0.5% (comparing with ellipsometry results for Thermal Oxide sample by using the same optical constants)
- Repeatability*: < 2 Å (1 sigma from 50 thickness readings for 1500 ? Thermal SiO2 on Si Wafer)